Process Development

To establish a reliable processing recipe that leads to cost-effective and high-volume production.

Micro-lithographic photoresist processing and measurement.
Micro-lithographic pattern alignment and transfer using step and repeat exposure tools.
Micro-lithographic pattern alignment and transfer using contact/proximity and backside alignment exposure tools.
Semi-automated wafer inspection and image capture systems.
RF-bias sputter deposition of dielectric materials.
Reactive and non-reactive ion beam etching cluster tool in operation.
Automated surface cleaning system.
Service-chase view of Giant Magneto-Resistive (GMR) spin-valve cluster deposition and etch system.
Automated in-line and final electrical parametric testing.